Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Development of a large RF plasma source for dust removal.
- Authors
- 정규선
- Issue Date
- 6-Jul-2011
- Publisher
- ICMAP2011 Organizing Committee
- Citation
- The third international conference on microelectronis and plasma technology.
- Conference Name
- The third international conference on microelectronis and plasma technology.
- Place
- china, Dalian
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 전기공학전공 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.