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Performance of Organic Field Effect Transistors with High-k Gate Oxide after Application of Consecutive Bias Stress
- Authors
- 안진호
- Issue Date
- 20110519
- Place
- Korea
- Conference Name
- 22nd IC ME&D
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)