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Design of Extreme Proximity Gettering for Advanced Semiconductor Devices Beyond 3X nm Technology - Understanding the dependency of Cu decoration on crystalline nature after device heat-treatment of 3X technology
- Authors
- 박재근
- Issue Date
- 18-May-2011
- Place
- University of Washington UW Tower
- Conference Name
- 2011 SiWEDS Spring Meeting
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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