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High Oxide-to-poly Si Removal Selectivity Ceria Slurry for Poly Si Stop Chemical Mechanical Planarization (CMP) in Multi-level Cell (MLC) NAND Flash Memory below 51nm
- Authors
- 백운규
- Issue Date
- 28-Apr-2011
- Place
- San Francisco, USA
- Conference Name
- 2011 MRS spring meeting
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Collections - 서울 공과대학 > 서울 에너지공학과 > 2. Conference Papers
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Related Researcher
- Paik, Ungyu
- COLLEGE OF ENGINEERING (DEPARTMENT OF ENERGY ENGINEERING)