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Increase in the Adsorption Density of Anionic Molecules on Ceria and Its Influence on Remaining Particles on Oxide Film During Shallow Trench Isolation(STI) Chemical Mechanical Planarization (CMP)

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dc.contributor.author백운규-
dc.date.accessioned2021-08-03T20:19:06Z-
dc.date.available2021-08-03T20:19:06Z-
dc.date.issued2010-04-06-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/59282-
dc.titleIncrease in the Adsorption Density of Anionic Molecules on Ceria and Its Influence on Remaining Particles on Oxide Film During Shallow Trench Isolation(STI) Chemical Mechanical Planarization (CMP)-
dc.typeConference-
dc.citation.conferenceName2010 MRS SPRING MEETING-
dc.citation.conferencePlaceSan Freancisco-
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서울 공과대학 > 서울 에너지공학과 > 2. Conference Papers

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