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Increase in the Adsorption Density of Anionic Molecules on Ceria and Its Influence on Remaining Particles on Oxide Film During Shallow Trench Isolation(STI) Chemical Mechanical Planarization (CMP)
- Authors
- 백운규
- Issue Date
- 6-Apr-2010
- Place
- San Freancisco
- Conference Name
- 2010 MRS SPRING MEETING
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Collections - 서울 공과대학 > 서울 에너지공학과 > 2. Conference Papers
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Related Researcher
- Paik, Ungyu
- COLLEGE OF ENGINEERING (DEPARTMENT OF ENERGY ENGINEERING)