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Characteristics of Thin Films Deposition of Ruthenium on Various SiO2 Substrates by Remote Plasma Atomic Layer Deposition

Authors
전형탁
Issue Date
20091108
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/60120
Place
San Jose, CA, USA
Conference Name
AVS 56th International Symposium & exhibition
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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Jeon, Hyeongtag
COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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