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Effects of RF-bias power on plasma parameters in a low gas pressure inductively coupled plasma

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dc.contributor.author정진욱-
dc.date.accessioned2021-08-03T20:52:42Z-
dc.date.available2021-08-03T20:52:42Z-
dc.date.created2021-06-30-
dc.date.issued2009-10-20-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/60577-
dc.publisherAmerican physical Society-
dc.titleEffects of RF-bias power on plasma parameters in a low gas pressure inductively coupled plasma-
dc.typeConference-
dc.contributor.affiliatedAuthor정진욱-
dc.identifier.bibliographicCitation62th Gaseous Electronics Conference-
dc.relation.isPartOf62th Gaseous Electronics Conference-
dc.citation.title62th Gaseous Electronics Conference-
dc.citation.conferencePlaceUS-
dc.type.rimsCONF-
dc.description.journalClass1-
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