Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Improvement of Imaging Properties by Optimizing the Mask Structure Using Phase Shift Effect
- Authors
- 안진호
- Issue Date
- 20-Oct-2009
- Place
- Czech
- Conference Name
- 2009 international Symposium Extreme ultraviolet lithograph On EUV Lithography
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)