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Interface and Passivation Effect on Subthreshold Transport of Carbon Nanotube Network Transistor by Plasma Enhanced Chemical Vapor Deposition

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dc.contributor.author박완준-
dc.date.accessioned2021-08-03T21:19:37Z-
dc.date.available2021-08-03T21:19:37Z-
dc.date.issued2009-10-07-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/60824-
dc.description.abstractEffects on subthre-shold transport by the types of gate dielectric and passiva-tion are systematically presented for transistors with the random network of nanotubes which were grown by the PECVD-
dc.titleInterface and Passivation Effect on Subthreshold Transport of Carbon Nanotube Network Transistor by Plasma Enhanced Chemical Vapor Deposition-
dc.typeConference-
dc.citation.conferenceName2009 International Conference on Solid State Devices and Materials-
dc.citation.conferencePlace센다이, 일본-
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서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers

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