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Interface and Passivation Effect on Subthreshold Transport of Carbon Nanotube Network Transistor by Plasma Enhanced Chemical Vapor Deposition
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 박완준 | - |
| dc.date.accessioned | 2021-08-03T21:19:37Z | - |
| dc.date.available | 2021-08-03T21:19:37Z | - |
| dc.date.issued | 2009-10-07 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/60824 | - |
| dc.description.abstract | Effects on subthre-shold transport by the types of gate dielectric and passiva-tion are systematically presented for transistors with the random network of nanotubes which were grown by the PECVD | - |
| dc.title | Interface and Passivation Effect on Subthreshold Transport of Carbon Nanotube Network Transistor by Plasma Enhanced Chemical Vapor Deposition | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | 2009 International Conference on Solid State Devices and Materials | - |
| dc.citation.conferencePlace | 센다이, 일본 | - |
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