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Optimizing Structure of Attenuated Phase Shift Mask for Minimizing Shadowing Effect
- Authors
- 안진호
- Issue Date
- 20090715
- Place
- USA(Honolulu, Hawaii)
- Conference Name
- 2009 International Workshop On EUV Lithography
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)