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Effect of pH in Colloidal Silica Slurry on Polishing Rate Selectivity of Nitrogen-doped Ge2Sb2Te5 to SiO2 in Chemical Mechanical Polishing
- Authors
- 백운규
- Issue Date
- 21-May-2009
- Place
- 무조리조트 티롤호텔
- Conference Name
- 춘계학술발표대회 및 제16회 신소재 심포지엄
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Collections - 서울 공과대학 > 서울 에너지공학과 > 2. Conference Papers
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Related Researcher
- Paik, Ungyu
- COLLEGE OF ENGINEERING (DEPARTMENT OF ENERGY ENGINEERING)