Fabrication of two-dimensional magnetic arrays using CMOS process
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 이성재 | - |
dc.date.accessioned | 2021-08-03T23:22:08Z | - |
dc.date.available | 2021-08-03T23:22:08Z | - |
dc.date.created | 2021-06-30 | - |
dc.date.issued | 2008-08-28 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/64015 | - |
dc.description.abstract | An effective and inexpensive fabrication method of two-dimensional magnetic arrays is developed. In order to make nano-sized structures reliably, the CMOS process, that is a proven technology in the semiconductor industry, was adopted. By using photo-lithograghy of KrF laser source, several design patterns, such as Figure 1, were achieved on a 40-nm-thick Co layer on a 6-inch Si wafer and various ferromagnetic Co array patterns were fabricated by a wet etching method. Its pattern sizes ranged from 200 to 800nm. In this presentation, we mainly discuss the key processes to prepare nano-scaled two-dimensional magnetic arrays and show how to control and optimize the design parameters of array structures. In addition, the measured data for the electro-magnetic and the magneto-optic properties are presented. | - |
dc.publisher | NanoKorea Research Association | - |
dc.title | Fabrication of two-dimensional magnetic arrays using CMOS process | - |
dc.type | Conference | - |
dc.contributor.affiliatedAuthor | 이성재 | - |
dc.identifier.bibliographicCitation | Nano Korea 2008 | - |
dc.relation.isPartOf | Nano Korea 2008 | - |
dc.citation.title | Nano Korea 2008 | - |
dc.citation.conferencePlace | Ilsan, Korea | - |
dc.type.rims | CONF | - |
dc.description.journalClass | 1 | - |
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