Fabrication of two-dimensional magnetic arrays using CMOS process

Abstract

An effective and inexpensive fabrication method of two-dimensional magnetic arrays is developed. In order to make nano-sized structures reliably, the CMOS process, that is a proven technology in the semiconductor industry, was adopted. By using photo-lithograghy of KrF laser source, several design patterns, such as Figure 1, were achieved on a 40-nm-thick Co layer on a 6-inch Si wafer and various ferromagnetic Co array patterns were fabricated by a wet etching method. Its pattern sizes ranged from 200 to 800nm. In this presentation, we mainly discuss the key processes to prepare nano-scaled two-dimensional magnetic arrays and show how to control and optimize the design parameters of array structures. In addition, the measured data for the electro-magnetic and the magneto-optic properties are presented.