Molecular Layer Deposition of Organic-Inorganic Hybrid Films Using Trimethylaluminum and Self-assembled Monolayers

Abstract

Organic-inorganic hybrid films were fabricated by a new growth technique that can control thickness with nanometer level. This method is based on molecular layer deposition of self-assembled monolayers (SAMs) in gas phase. The alkene terminated alkysiloxane self-assembled monolayer was formed by exposing a substrate to C=C terminated alkyltrichlorosilane and water vapor in ALD chamber. The terminal vinyl groups were converted to carboxylic groups with ozone treatment. The highly active aluminum hydroxyl linker layer was formed on the carboxylic terminated SAMs by using trimethylaluminum adsorption followed by exchange reaction of water molecule in order to provide highly active adsorption sites for the anchoring of the next monolayer. The organic multilayers, which are sequentially deposited in ALD chamber, were investigated by using x-ray photoelectron microscopy (XPS), contact angle analysis (CAA), atomic force microscopy (AFM), transmission electron microscopy (TEM) and digital multi-meter.