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Characteristics of HfN/HfO2 Gate Stacks Deposited by Remote Plasma Atomic Layer Deposition Method
- Authors
- 전형탁
- Issue Date
- 12-Apr-2007
- Place
- Moscone West and San Francisco Marriott, San Francisco
- Conference Name
- 2007 MRS Spring Meeting
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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