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Characteristics of Hafnium Nitridefilms deposited by Remote Plasma enhanced Atomic Layer Deposition method
- Authors
- 전형탁
- Issue Date
- 25-Jul-2006
- Place
- 서울교육문화회관
- Conference Name
- AVS International Conference on Atomic Layer Deposition
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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