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HfO2 Thin Film Deposited by Remote Plasma Atomic Layer Deposition Method
- Authors
- 전형탁
- Issue Date
- 2-Mar-2006
- Place
- Cancun, MEXICO
- Conference Name
- 210th Meeting of the Electrochemical Society
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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