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Diffracted moire fringes as analysis and alignment tools for multilayer fabrication in soft lithography
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 오차환 | - |
| dc.date.accessioned | 2021-08-04T03:50:09Z | - |
| dc.date.available | 2021-08-04T03:50:09Z | - |
| dc.date.issued | 2005-11-06 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/71163 | - |
| dc.description.abstract | ... | - |
| dc.title | Diffracted moire fringes as analysis and alignment tools for multilayer fabrication in soft lithography | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 3rd international symposium on advanced photonic science and technology | - |
| dc.citation.conferencePlace | Shanghai, China | - |
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Collections - 서울 자연과학대학 > 서울 물리학과 > 2. Conference Papers
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Related Researcher
- Oh, Cha Hwan
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)