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Diffracted moire fringes as analysis and alignment tools for multilayer fabrication in soft lithography
- Authors
- 오차환
- Issue Date
- 6-Nov-2005
- Place
- Shanghai, China
- Conference Name
- The 3rd international symposium on advanced photonic science and technology
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Collections - 서울 자연과학대학 > 서울 물리학과 > 2. Conference Papers
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Related Researcher
- Oh, Cha Hwan
- COLLEGE OF NATURAL SCIENCES (DEPARTMENT OF PHYSICS)