Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
"Characteristics of HfN deposited by using Remote Plasma Enhanced Atomic Layer Deposition Method"
- Authors
- 전형탁
- Issue Date
- 2-Nov-2005
- Place
- Hynes Convention Center, Boston, MA.
- Conference Name
- AVS 52nd International Symposium & Exhibition
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.