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HfO2/SiOxNy/Si 게이트 유전체 구조의 열처리에 따른 열적 안정성과 전기적 특성
- Authors
- 전형탁
- Issue Date
- 16-Aug-2005
- Place
- Ottawa, Canada
- Conference Name
- Twelfth Canadian Semiconductor Technology Conference
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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