Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Effect of Agglomerated Secondary Abrasive Size in Nano Ceria Slurry on Oxide and Nitride Films Removal Rate of Pattern Wafer
- Authors
- 백운규
- Issue Date
- 22-Apr-2005
- Place
- 이화여자대학교
- Conference Name
- 한국물리학회
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 에너지공학과 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Paik, Ungyu
- COLLEGE OF ENGINEERING (DEPARTMENT OF ENERGY ENGINEERING)