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In-situ Analysis of HfO2 Formation in Remote Plasma Atomic Layer Deposition Process
- Authors
- 전형탁
- Issue Date
- 17-Aug-2004
- Place
- Helsinki,Finland
- Conference Name
- Atomic Layer Deposition 2004(ALD`04)
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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