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Nanotopography Simulation of Shallow Trench Isolation Chemical Mechanical Polishing Using Nano Ceria Slurry
- Authors
- 박재근
- Issue Date
- 8-Jul-2004
- Place
- Yong-Peong Resort, KangWon-do, Korea
- Conference Name
- KIEEME Annual Summer Conference 2004
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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