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The modification of icp plasma etching characteristics of SiO2 waveguide film by femtosecond laser

Authors
신동욱
Issue Date
23-Jun-2004
Publisher
Ceramic Processing Research Center
Citation
2004 international Nano Ceramics/Crystals Forum and international Symposium on intermaterials
URI
https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/74358
Conference Name
2004 international Nano Ceramics/Crystals Forum and international Symposium on intermaterials
Place
한양 대학교
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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SHIN, DONG WOOK
COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)
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