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Angular Dependency of Off-axis Illumination on 100 nm-width Pattern Printability for Extreme Ultraviolet Lithography: Ru/Mo/Si Reflector System
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 정용재 | - |
| dc.date.accessioned | 2021-08-04T05:54:39Z | - |
| dc.date.available | 2021-08-04T05:54:39Z | - |
| dc.date.created | 2021-06-30 | - |
| dc.date.issued | 2004-06-02 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/74506 | - |
| dc.publisher | The American Vacuum Society | - |
| dc.title | Angular Dependency of Off-axis Illumination on 100 nm-width Pattern Printability for Extreme Ultraviolet Lithography: Ru/Mo/Si Reflector System | - |
| dc.type | Conference | - |
| dc.contributor.affiliatedAuthor | 정용재 | - |
| dc.identifier.bibliographicCitation | The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication | - |
| dc.relation.isPartOf | The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication | - |
| dc.citation.title | The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication | - |
| dc.citation.conferencePlace | San Diego, USA | - |
| dc.type.rims | CONF | - |
| dc.description.journalClass | 1 | - |
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Chung, Yong Chae
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)