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Angular Dependency of Off-axis Illumination on 100 nm-width Pattern Printability for Extreme Ultraviolet Lithography: Ru/Mo/Si Reflector System
- Authors
- 정용재
- Issue Date
- 2-Jun-2004
- Publisher
- The American Vacuum Society
- Citation
- The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
- Conference Name
- The 48th International Conference on Electron, Ion and Photon Beam Technology and Nanofabrication
- Place
- San Diego, USA
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Chung, Yong Chae
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)