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A Study on the Protection of Photoresist Deformation during Dry Etching
- Authors
- 김태환
- Issue Date
- 28-Apr-2004
- Publisher
- Harbin Institute of Technology, Hanyang University, The National Program for Tera-level Nanodevices
- Citation
- 2004 The 4th China-Korea Symposium Semiconductor and IT
- Conference Name
- 2004 The 4th China-Korea Symposium Semiconductor and IT
- Place
- International Conference Room, Hanyang University, Seoul, Korea
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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