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DC Bias에 의해 radical 효과가 극대화된 플라즈마 원자층 증착법으로 BDEAS 와 CO2 plasma로 증착된 고품질 SiO2 박막 High quality SiO2 film by radical improved DC bias PEALD using BDEAS and CO2 plasma
- Authors
- 전형탁
- Issue Date
- 20201016
- Place
- 명지대 자연캠퍼스 창조예술관 5층
- Conference Name
- 2020년 온라인 추계학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Jeon, Hyeongtag
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)