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Effect of Molecular Weight of Surfactant in Nano Ceria Slurry on Shallow Trench Isolation Chemical Mechanical Polishing
- Authors
- 박재근
- Issue Date
- 14-May-2004
- Place
- Kang-Reung University, Kang-Reung, Korea
- Conference Name
- 2004 Spring, Materials Research Society of Korea
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Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
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