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Barrier Characteristics of TaN films deposited by remote plasma enhanced atomic layer deposition (PEALD) method using metal Organic Precursor
- Authors
- 전형탁
- Issue Date
- 19-Feb-2004
- Place
- 무주리조트 호텔티롤
- Conference Name
- 제11회 한국반도체학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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