Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Dependence of Planarization Efficiency on Crystal Characteristic of Abrasives in Nano Ceria Slurry for Shallow Trench Isolation Chemcial Mechanical Polishing
- Authors
- 박재근
- Issue Date
- 19-Feb-2004
- Place
- Mujoo Resort, Seoul, Korea
- Conference Name
- Korean Confernce on Semiconductors 11th
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 융합전자공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.