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Atomic Layer Deposition of HfO2/Al2O3 and ZrO2/Al2O3 Films for Gate Dielectric Applications
- Authors
- 전형탁
- Issue Date
- 20031202
- Place
- Hynes Convention Center and Sheraton Boston HotelBoston,U.S.A
- Conference Name
- 2003 MRS Fall Meeting
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Jeon, Hyeongtag
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)