Detailed Information
Cited 0 time in 
Cited 0 time in 
Cited 0 time in
Metadata Downloads
Plasma Enhanced Atomic Layer Deposition of HfO2 Gate Dielectric
- Authors
- 전형탁
- Issue Date
- 20030227
- Place
- 그랜드힐튼 서울호텔 컨벤션센터
- Conference Name
- 제 10회 한국반도체학술대회
- Files in This Item
- There are no files associated with this item.
- Appears in
Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
Items in ScholarWorks are protected by copyright, with all rights reserved, unless otherwise indicated.
Related Researcher
- Jeon, Hyeongtag
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)