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Plasma Enhanced Atomic Layer Deposition of HfO2 Gate Dielectric
- Authors
- 전형탁
- Issue Date
- 27-Feb-2003
- Place
- 그랜드힐튼 서울호텔 컨벤션센터
- Conference Name
- 제 10회 한국반도체학술대회
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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