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Characteristics of TiN films deposited by plasma enhanced atomic layer deposition (PEALD) method
- Authors
- 전형탁
- Issue Date
- 20021128
- Place
- Hanyang University, Seoul, Korea
- Conference Name
- 2002 Annual Conference of Core University Program (CUP) on Ceramic Materials Technology
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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Related Researcher
- Jeon, Hyeongtag
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)