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Characteristics of TiN Films Deposited by rf Remote Plasma Enhanced Atomic Layer Deposition (ALD) Method using Metal Organic Precursor
- Authors
- 전형탁
- Issue Date
- 6-Nov-2002
- Place
- Colorado Convention Center Denver, Colorado
- Conference Name
- 49th AVS International Symposium
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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