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A study on the simulation and characterization of the barrier layers for EUV reflective multilayers for EUV lithography applications
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 안진호 | - |
| dc.date.accessioned | 2021-08-04T07:53:09Z | - |
| dc.date.available | 2021-08-04T07:53:09Z | - |
| dc.date.issued | 2002-10-09 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/77710 | - |
| dc.title | A study on the simulation and characterization of the barrier layers for EUV reflective multilayers for EUV lithography applications | - |
| dc.type | Conference | - |
| dc.citation.conferenceName | The 3rd Japan-Korea Joint Workshop on Advanced Semiconductor Processes and Equipments | - |
| dc.citation.conferencePlace | Hakone | - |
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Related Researcher
- Ahn, Jinho
- COLLEGE OF ENGINEERING (SCHOOL OF MATERIALS SCIENCE AND ENGINEERING)