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Effect of Compositional Variations on the Barrier Characteristic of TiAlN films Deposited by Metal Organic Atomic Layer Deposition(MOALD) Method
- Authors
- 김영도
- Issue Date
- 19-Jul-2001
- Place
- Paros Hotel, Yangpyung
- Conference Name
- The Fourth joint Symposium on Electronic Materials
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Collections - 서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers
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