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High transmittance SiC membrane by ECR plasma CVD in combination with Rapid Thermal Annealing

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dc.contributor.author안진호-
dc.date.accessioned2021-08-04T10:49:33Z-
dc.date.available2021-08-04T10:49:33Z-
dc.date.issued1998-07-01-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/82215-
dc.titleHigh transmittance SiC membrane by ECR plasma CVD in combination with Rapid Thermal Annealing-
dc.typeConference-
dc.citation.conferenceNameInternational Microprocesses and Nanotechnology Conference-
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서울 공과대학 > 서울 신소재공학부 > 2. Conference Papers

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