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Comparison of Si₃N₄-SiO₂ and SiO₂ Insulation Layer for Zero-Bias CMUT Operation Using Dielectric Charging Effects

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dc.contributor.authorChoi, Won Young-
dc.contributor.authorLee, Chang Hoon-
dc.contributor.authorKim, Young Hun-
dc.contributor.authorPark, Kwan Kyu-
dc.date.accessioned2021-08-02T09:28:35Z-
dc.date.available2021-08-02T09:28:35Z-
dc.date.created2021-05-12-
dc.date.issued2020-04-
dc.identifier.issn0885-3010-
dc.identifier.urihttps://scholarworks.bwise.kr/hanyang/handle/2021.sw.hanyang/9899-
dc.description.abstractIn this letter, we report the characteristics of zero-bias capacitive micromachined ultrasonic transducers (CMUTs) in various aspects, considering the transmission and reception sensitivity and evaluation of the long-term stability with ac transmission in immersion. The main idea of the zero-bias CMUT implementation is that the charge is injected by the dielectric charging effects in an insulation layer in the pull-in state. The CMUT was fabricated by a local oxidation of silicon (LOCOS) process, and the insulation layer consists of Si-₃ N-₄ -SiO₂ and SiO₂, which have been commonly used in previous studies. A study on the charging effects is reported to quantitatively observe the voltage shift by charge transfer with time dependence at different temperatures and collapsing time dependence. Therefore, we successfully implemented a zero-bias CMUT with a transmission efficiency of 4.62 kPa/V at a center frequency of 7.53 MHz in Si-₃ N-₄-SiO₂ and a transmission efficiency of 6.78 kPa/V at a center frequency of 7.86 MHz in SiO₂ immersion.-
dc.language영어-
dc.language.isoen-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleComparison of Si₃N₄-SiO₂ and SiO₂ Insulation Layer for Zero-Bias CMUT Operation Using Dielectric Charging Effects-
dc.typeArticle-
dc.contributor.affiliatedAuthorPark, Kwan Kyu-
dc.identifier.doi10.1109/TUFFC.2019.2950902-
dc.identifier.scopusid2-s2.0-85082561115-
dc.identifier.wosid000522170700021-
dc.identifier.bibliographicCitationIEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL, v.67, no.4, pp.879 - 882-
dc.relation.isPartOfIEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL-
dc.citation.titleIEEE TRANSACTIONS ON ULTRASONICS FERROELECTRICS AND FREQUENCY CONTROL-
dc.citation.volume67-
dc.citation.number4-
dc.citation.startPage879-
dc.citation.endPage882-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.isOpenAccessN-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.relation.journalResearchAreaAcoustics-
dc.relation.journalResearchAreaEngineering-
dc.relation.journalWebOfScienceCategoryAcoustics-
dc.relation.journalWebOfScienceCategoryEngineering, Electrical & Electronic-
dc.subject.keywordPlusMICROMACHINED ULTRASONIC TRANSDUCERS-
dc.subject.keywordAuthorDielectrics-
dc.subject.keywordAuthorSensitivity-
dc.subject.keywordAuthorInsulation-
dc.subject.keywordAuthorAcoustics-
dc.subject.keywordAuthorSilicon-
dc.subject.keywordAuthorTemperature measurement-
dc.subject.keywordAuthorThermal stability-
dc.subject.keywordAuthorCapacitive micromachined ultrasonic transducer (CMUT)-
dc.subject.keywordAuthordielectric charging-
dc.subject.keywordAuthorzero bias-
dc.identifier.urlhttps://ieeexplore.ieee.org/document/8890708-
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