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Low-temperature direct synthesis of high quality WS <inf>2</inf> thin films by plasma-enhanced atomic layer deposition for energy related applications
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| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Yeo | - |
| dc.contributor.author | S. | - |
| dc.contributor.author | Nandi | - |
| dc.contributor.author | D.K. | - |
| dc.contributor.author | Rahul | - |
| dc.contributor.author | R. | - |
| dc.contributor.author | Kim | - |
| dc.contributor.author | T.H. | - |
| dc.contributor.author | Shong, Bonggeun | - |
| dc.contributor.author | B. | - |
| dc.contributor.author | Jang | - |
| dc.contributor.author | Y. | - |
| dc.contributor.author | Bae | - |
| dc.contributor.author | J.-S. | - |
| dc.contributor.author | Han | - |
| dc.contributor.author | J.W. | - |
| dc.contributor.author | Kim | - |
| dc.contributor.author | S.-H. | - |
| dc.contributor.author | Kim | - |
| dc.contributor.author | H. | - |
| dc.date.available | 2021-03-17T08:43:43Z | - |
| dc.date.created | 2021-02-26 | - |
| dc.date.issued | 2018 | - |
| dc.identifier.uri | https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/13069 | - |
| dc.title | Low-temperature direct synthesis of high quality WS <inf>2</inf> thin films by plasma-enhanced atomic layer deposition for energy related applications | - |
| dc.type | Article | - |
| dc.contributor.affiliatedAuthor | Shong, Bonggeun | - |
| dc.identifier.doi | 10.1016/j.apsusc.2018.07.210 | - |
| dc.identifier.scopusid | 2-s2.0-85051136485 | - |
| dc.identifier.bibliographicCitation | Applied Surface Science, v.459, pp.596 - 605 | - |
| dc.relation.isPartOf | Applied Surface Science | - |
| dc.citation.title | Applied Surface Science | - |
| dc.citation.volume | 459 | - |
| dc.citation.startPage | 596 | - |
| dc.citation.endPage | 605 | - |
| dc.type.rims | ART | - |
| dc.type.docType | Article | - |
| dc.description.journalClass | 1 | - |
| dc.description.journalRegisteredClass | scopus | - |
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Related Researcher
- Shong, Bong geun
- Engineering (Chemical Engineering)