Prediction of Electric Field Effects on Defect-Free Self-Assembled Nano-Patterning of Block Copolymer
DC Field | Value | Language |
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dc.contributor.author | Kim, Sang-Kon | - |
dc.date.available | 2021-03-17T09:44:32Z | - |
dc.date.created | 2020-07-06 | - |
dc.date.issued | 2016-03 | - |
dc.identifier.issn | 1533-4880 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/13410 | - |
dc.description.abstract | For future semiconductor device scaling, self-assembly, directed self-assembly (DSA) of block copolymers (BCPs), is a promising method with simplified processing conditions; however, critical challenge is defect control for fine pattern. Electric field is a method for the defect control. In this paper, for electric field effects to jog defects, the electric field induced self-assembled patterns is modeled and simulated by using the Monte Carlo method of dielectric polymers, the self-consistentfield theory (SCFT), and the Navier-Stokes equation. Electric field effects are quantified by using defect degree. Defective patterns are forced to undergo a phase transition to lamellar phase under electric field. For the high electric field, the excess free energy for the defect-free state becomes small. Simulation results can help to optimize electric field and process time in terms of defect area. | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | AMER SCIENTIFIC PUBLISHERS | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | ORDER | - |
dc.title | Prediction of Electric Field Effects on Defect-Free Self-Assembled Nano-Patterning of Block Copolymer | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | Kim, Sang-Kon | - |
dc.identifier.doi | 10.1166/jnn.2016.11082 | - |
dc.identifier.scopusid | 2-s2.0-84960385250 | - |
dc.identifier.wosid | 000374153800086 | - |
dc.identifier.bibliographicCitation | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.16, no.3, pp.2706 - 2709 | - |
dc.relation.isPartOf | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | - |
dc.citation.title | JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY | - |
dc.citation.volume | 16 | - |
dc.citation.number | 3 | - |
dc.citation.startPage | 2706 | - |
dc.citation.endPage | 2709 | - |
dc.type.rims | ART | - |
dc.type.docType | Article | - |
dc.description.journalClass | 1 | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.relation.journalResearchArea | Chemistry | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.relation.journalResearchArea | Materials Science | - |
dc.relation.journalResearchArea | Physics | - |
dc.relation.journalWebOfScienceCategory | Chemistry, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology | - |
dc.relation.journalWebOfScienceCategory | Materials Science, Multidisciplinary | - |
dc.relation.journalWebOfScienceCategory | Physics, Applied | - |
dc.relation.journalWebOfScienceCategory | Physics, Condensed Matter | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | ORDER | - |
dc.subject.keywordAuthor | Lithography | - |
dc.subject.keywordAuthor | Lithography Simulation | - |
dc.subject.keywordAuthor | Self-Assembly | - |
dc.subject.keywordAuthor | Monte Carlo Method | - |
dc.subject.keywordAuthor | Self-Consistent-Field Theory | - |
dc.subject.keywordAuthor | Electrohydrodynamic Lithography | - |
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