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Results 1-2 of 2 (Search time: 0.002 seconds).
Line-edge roughness on fin-field-effect-Transistor performance for below 10nm patterns
Kim, Sang-kon
; S.-K.
Article
Issue Date
2019
Citation
Proceedings of SPIE - The International Society for Optical Engineering, v.10957
Publisher
SPIE
Line-Edge Roughness Stochastics for 5-nm Pattern Formation in the Extreme Ultraviolet Lithography
Kim, Sang-Kon
Article
Issue Date
2019
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.19, no.8, pp.4657 - 4660
Publisher
AMER SCIENTIFIC PUBLISHERS
1
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Subject
EUV
2
LER
2
FinFET
1
Line Edge Roughness
1
Line edge roughness
1
Lithography
1
lithography
1
Lithography Simulation
1
lithography simulation
1
Stochastic Simulation
1
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