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Results 1-6 of 6 (Search time: 0.013 seconds).
Line‐edge roughness from extreme ultraviolet lithography to fin‐field‐effect‐transistor: Computational study
Kim, S.-K.
Article
Issue Date
2021
Citation
Micromachines, v.12, no.12
Publisher
MDPI
Line-edge roughness on fin-field-effect-Transistor performance for below 10nm patterns
Kim, Sang-kon
; S.-K.
Article
Issue Date
2019
Citation
Proceedings of SPIE - The International Society for Optical Engineering, v.10957
Publisher
SPIE
Line-Edge Roughness on Fin-Field-Effect-Transistor Performance for 7-nm and 5-nm Patterns
Kim, Sang-Kon
Article
Issue Date
2020
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.20, no.11, pp.6912 - 6915
Publisher
AMER SCIENTIFIC PUBLISHERS
Computational Study of Extreme Ultraviolet Vote-Taking Lithography for Defect Repair
Kim, Sang-Kon
Article
Issue Date
2020
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.20, no.8, pp.4994 - 4997
Publisher
AMER SCIENTIFIC PUBLISHERS
Line-Edge Roughness Stochastics for 5-nm Pattern Formation in the Extreme Ultraviolet Lithography
Kim, Sang-Kon
Article
Issue Date
2019
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.19, no.8, pp.4657 - 4660
Publisher
AMER SCIENTIFIC PUBLISHERS
Effects of Line-Edge Roughness on Extreme Ultraviolet Lithography CDs and Fin-Field-Effect-Transistor Performance for Below 10-nm Patterns
Kim, Sang-Kon
Article
Issue Date
2017
Citation
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, v.17, no.11, pp.8338 - 8343
Publisher
AMER SCIENTIFIC PUBLISHERS
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Lithography
5
FinFET
4
Lithography Simulation
4
Line Edge Roughness
3
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2
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DEVICES
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Extreme ultraviolet
1
Fin‐field‐effect‐transistor
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