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Results 1-1 of 1 (Search time: 0.004 seconds).
Line‐edge roughness from extreme ultraviolet lithography to fin‐field‐effect‐transistor: Computational study
Kim, S.-K.
Article
Issue Date
2021
Citation
Micromachines, v.12, no.12
Publisher
MDPI
1
Discover
Author
kim, sang-kon
1
Subject
DEVICE
1
Extreme ultraviolet
1
FinFET
1
Fin‐field‐effect‐transistor
1
INGAAS
1
LER
1
LINEWIDTH
1
Line‐edge roughness
1
Lithography
1
Lithography simulation
1
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Date Issued
2021
1
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English
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Micromachines
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