Initial nucleation for atomic layer deposition (ALD) of group III oxides: a quantum chemical comparative study
DC Field | Value | Language |
---|---|---|
dc.contributor.author | 송봉근 | - |
dc.date.available | 2020-07-10T03:01:39Z | - |
dc.date.created | 2020-07-08 | - |
dc.date.issued | 2019-04-25 | - |
dc.identifier.uri | https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/1717 | - |
dc.language | 영어 | - |
dc.language.iso | en | - |
dc.publisher | 한국화학공학회 | - |
dc.title | Initial nucleation for atomic layer deposition (ALD) of group III oxides: a quantum chemical comparative study | - |
dc.type | Article | - |
dc.contributor.affiliatedAuthor | 송봉근 | - |
dc.identifier.bibliographicCitation | 한국화학공학회 학술대회 초록집, v.0, no.0, pp.0 - 0 | - |
dc.relation.isPartOf | 한국화학공학회 학술대회 초록집 | - |
dc.citation.title | 한국화학공학회 학술대회 초록집 | - |
dc.citation.volume | 0 | - |
dc.citation.number | 0 | - |
dc.citation.startPage | 0 | - |
dc.citation.endPage | 0 | - |
dc.type.rims | ART | - |
dc.description.journalClass | 2 | - |
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