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Initial nucleation for atomic layer deposition (ALD) of group III oxides: a quantum chemical comparative study

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dc.contributor.author송봉근-
dc.date.available2020-07-10T03:01:39Z-
dc.date.created2020-07-08-
dc.date.issued2019-04-25-
dc.identifier.urihttps://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/1717-
dc.language영어-
dc.language.isoen-
dc.publisher한국화학공학회-
dc.titleInitial nucleation for atomic layer deposition (ALD) of group III oxides: a quantum chemical comparative study-
dc.typeArticle-
dc.contributor.affiliatedAuthor송봉근-
dc.identifier.bibliographicCitation한국화학공학회 학술대회 초록집, v.0, no.0, pp.0 - 0-
dc.relation.isPartOf한국화학공학회 학술대회 초록집-
dc.citation.title한국화학공학회 학술대회 초록집-
dc.citation.volume0-
dc.citation.number0-
dc.citation.startPage0-
dc.citation.endPage0-
dc.type.rimsART-
dc.description.journalClass2-
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