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Thermoelectric transport properties of S-doped In0.9Si0.1SeThermoelectric transport properties of S-doped In0.9Si0.1Se

Other Titles
Thermoelectric transport properties of S-doped In0.9Si0.1Se
Authors
Kim, Dong HoKim, Hyun-SikRahman, Jamil UrShin, Weon HoKim, TaeWanKim, Sang-il
Issue Date
1-Jan-2022
Publisher
SPRINGER HEIDELBERG
Keywords
Thermoelectric; Metal chalcogenides; Anion doping
Citation
JOURNAL OF THE KOREAN CERAMIC SOCIETY, v.59, no.1, pp.64 - 69
Journal Title
JOURNAL OF THE KOREAN CERAMIC SOCIETY
Volume
59
Number
1
Start Page
64
End Page
69
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/18180
DOI
10.1007/s43207-021-00153-1
ISSN
1229-7801
Abstract
Layered metal chalcogenides with highly promising thermoelectric properties have attracted attention owing to their intrinsically low thermal conductivity, which originates from their unique layered structure and van der Waals bonding. InSe, a post-transition metal chalcogenide, also has layered atomic structure and low thermal conductivity. We investigate the effects of S doping of Si-doped InSe, In0.9Si0.1Se. The S-doped In0.9Si0.1Se exhibits enhanced thermoelectric properties, with a higher power factor and lower thermal conductivity compared to Si-doped InSe. A significant increase in carrier mobility has an overall positive effect on the electronic transport properties, resulting in a systematic increase in power factor from 0.05 to 0.15 mW/mK(2) with S doping. In addition, the thermal conductivity systematically decreases with S doping owing to additional point-defect scattering. Because of the higher power factor and lower thermal conductivity, the thermoelectric figure of merit of the In0.9Si0.1Se0.9S0.1 sample at 735 K was 0.18, which is 3.6 times that of In0.9Si0.1Se.
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