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Efficiency enhancement of the organic light-emitting diodes by oxygen plasma treatment of the ITO substrate

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dc.contributor.authorHong, J.W.-
dc.contributor.authorOh, D.H.-
dc.contributor.authorKim, C.H.-
dc.contributor.authorKim, G.Y.-
dc.contributor.authorKim, T.W.-
dc.date.accessioned2021-12-02T04:45:30Z-
dc.date.available2021-12-02T04:45:30Z-
dc.date.created2021-11-30-
dc.date.issued2012-
dc.identifier.issn1229-9162-
dc.identifier.urihttps://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/19106-
dc.description.abstractOxygen plasma has been treated on the surface of indium-tin-oxide (ITO) to improve the efficiency of the organic light-emitting diodes (OLEDs) device. The plasma treatment was expected to inject the holes effectively due to the control of an ITO work-function and the reduction of surface roughness. To optimize the treatment condition, a surface resistance and morphology of the ITO surface were investigated. The effect on the electrical properties of the OLEDs was evaluated as a function of oxygen plasma powers (0, 200, 250, 300, and 450 W). The electrical properties of the devices were measured in a device structure of ITO/TPD/Alq3/BCP/LiF/Al. It was found the plasma treatment of the ITO surface affects on the efficiency of the device. The efficiency of the device was optimized at the plasma power of 250 W and decreased at higher power than 250 W. The maximum values of luminance, luminous power efficiency, and external quantum efficiency of the plasma treated devices increase by 1. 4 times, 1. 4 times, and 1. 2 times, respectively, compared to those of the non-treated ones.-
dc.language영어-
dc.language.isoen-
dc.titleEfficiency enhancement of the organic light-emitting diodes by oxygen plasma treatment of the ITO substrate-
dc.typeArticle-
dc.contributor.affiliatedAuthorKim, T.W.-
dc.identifier.scopusid2-s2.0-84874197675-
dc.identifier.bibliographicCitationJournal of Ceramic Processing Research, v.13, no.SPL. ISS.2, pp.s193 - s197-
dc.relation.isPartOfJournal of Ceramic Processing Research-
dc.citation.titleJournal of Ceramic Processing Research-
dc.citation.volume13-
dc.citation.numberSPL. ISS.2-
dc.citation.startPages193-
dc.citation.endPages197-
dc.type.rimsART-
dc.type.docTypeArticle-
dc.description.journalClass1-
dc.description.journalRegisteredClassscie-
dc.description.journalRegisteredClassscopus-
dc.description.journalRegisteredClasskci-
dc.subject.keywordAuthorExternal quantum efficiency-
dc.subject.keywordAuthorLuminous power efficiency-
dc.subject.keywordAuthorPlasma treatment-
dc.subject.keywordAuthorSurface resistance-
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