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In-situ observation of phase transformation in amorphous silicon during Joule-heating induced crystallization process

Authors
Kim, Dong-HyunHong, Won-EuiRo, Jae-SangLee, Seong HyukLee, Chang-HoonPark, Seungho
Issue Date
1-Jun-2011
Publisher
ELSEVIER SCIENCE SA
Keywords
Joule-heating induced crystallization; In-situ measurements; Phase transformation; Amorphous silicon; Polycrystalline silicon
Citation
THIN SOLID FILMS, v.519, no.16, pp.5516 - 5522
Journal Title
THIN SOLID FILMS
Volume
519
Number
16
Start Page
5516
End Page
5522
URI
https://scholarworks.bwise.kr/hongik/handle/2020.sw.hongik/19867
DOI
10.1016/j.tsf.2011.03.053
ISSN
0040-6090
Abstract
During the Joule-heating induced crystallization (JIC) process of amorphous silicon for display applications, its phase transformation from amorphous to polycrystalline phases occurs through two different kinetic paths of either solid-to-solid or solid-to-liquid-to-solid phases. Depending on input conditions such as power density and pulsing time, each path results in nano-crystalline silicon phases or large grain structures produced by lateral growth, respectively. In this study, the phase-transformation phenomena during the JIC process were detected electrically and optically by the in-situ measurements of input voltage/current and normal reflectance at wavelength of 532 nm. The temperature field estimated from a simple conduction model confirms the phase-transformation behavior observed experimentally. In addition we could obtain the poly-Si structure produced by solid phase crystallization having the process time of 250 As and reaching the highest temperature around 1350 K. (C) 2011 Elsevier B.V. All rights reserved.
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College of Engineering > Department of Mechanical and System Design Engineering > 1. Journal Articles
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